专利名称：Visible light curing systems, methods for
reducing health risks to individuals exposedto systems designed to cure curablecompositions by exposure to radiation,methods for bonding substrates and visiblelight curing compositions
发明人：Mark M. Konarski,Edwin R. Perez,Eerik
Maandi,Vic Kadziela,Steven J.Hemsen,Ronald E. Belek
申请号：US11305005申请日：20051219公开号：US07915319B2公开日：20110329
摘要：The present invention provides visible light curing systems, methods forreducing health risks to individuals exposed to radiation curing systems, methods forbonding substrates and visible light curing compositions.
申请人：Mark M. Konarski,Edwin R. Perez,Eerik Maandi,Vic Kadziela,Steven J.Hemsen,Ronald E. Belek
地址：Old Saybrook CT US,Newington CT US,Rocky Hill CT US,Rocky Hill CTUS,Southington CT US,Coventry CT US
国籍：US,US,US,US,US,US
代理人：Steven C. Bauman
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