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Method for fabricating IGFET integrated circuits

2023-06-23 来源:爱go旅游网
专利内容由知识产权出版社提供

专利名称:Method for fabricating IGFET integrated

circuits

发明人:Hung-Fai S. Law,Alexander D. Lopez申请号:US06/108289申请日:19791228公开号:US04319396A公开日:19820316

摘要:A rapid and systematic method for performing chip layout of a random- logicIGFET circuit includes steps for arranging the device features and interconnectionfeatures corresponding to the circuit in respective positions in an array of intersectingrows and columns. The method provides layouts of device and interconnection featureshaving a high packing density and a high degree of order and regularity to facilitatechecking for layout errors.

申请人:BELL TELEPHONE LABORATORIES, INCORPORATED

代理人:Arthur J. Torsiglieri

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