专利名称：SELF-CORRECTING MULTIVARIATE
ANALYSIS FOR USE IN MONITORINGDYNAMIC PARAMETERS IN PROCESSENVIRONMENTS
发明人：LEV-AMI, Uzi, Josef,HENDLER, Lawrence申请号：EP06786397.7申请日：20060705公开号：EP1907908A2公开日：20080409
摘要：A method and apparatus for process monitoring are provided. Processmonitoring includes (i) generating a multivariate analysis reference model of a processenvironment from data corresponding to monitored parameters of the processenvironment; (ii) designating at least one of the monitored parameters as being
correlated to maturation of the process environment; (iii) collecting current process datacorresponding to the monitored parameters, including the at least one designatedparameter; and (iv) scaling the multivariate reference model based on the currentprocess data of the at least one designated parameter to account for maturation of theprocess environment. The method further includes generating one or more currentmultivariate analysis process metrics that represent a current state of the processenvironment from the current process data; and comparing the current process metricsto the scaled reference model to determine whether the current state of the processenvironment is acceptable.
申请人：MKS Instruments, Inc.
地址：90 Industrial Way Wilmington, MA 01887-4610 US
国籍：US
代理机构：von den Steinen, Axel
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