专利名称:Semiconductor device with multiple
recombination center layers
发明人:Tomoyoshi Kushida,Hiroshi Tadano,Yoshio
Nakamura
申请号:US06/912578申请日:19860926公开号:US04752818A公开日:19880621
摘要:A semiconductor device comprises two main electrode regions, i. e., cathode andanode regions consisting of high impurity concentration regions of opposite conductivitytypes, a low impurity concentration region locally formed between the two mainelectrode regions, a gate region, formed near the cathode region, for controlling a maincurrent, a first local region which has a relatively low carrier lifetime and is formed in aregion of the low impurity concentration region near at least one of the gate andcathode regions, and a second local region which has a relatively low carrier lifetime andis formed in a region of the low impurity concentration region which is depleted at theend of the main current turn-off process or which is not depleted to the end, thussatisfying three conditions, i.e., high-speed switching, low forward voltage drop, and highblocking voltage between the main electrodes at the same time.
申请人:KABUSHIKI KAISHA TOYOTA CHUO KENKYUSHO
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